This week we are exhibiting at the Focus on Microscopy 2016 conference in Taipei. Tony Pisano is there, and he brought a live SuperK EXTREME system with both a SuperK SELECT multiline filter and a SuperK VARIA tunable filter, so if you are looking to upgrade your imaging solution with a more flexible light source that can adapt to any fluorophore in the 400-2400 nm range, drop by our booth and have a chat with Tony. Or why not visit Leica Microsystems at their booth, where you can see their SP8X microscope equipped with our SuperK EXTREME supercontinuum laser.
